- Tytuł:
- Effects of Substrate Temperature on Structural Properties of Tin Oxide Films Produced by Plasma Oxidation after Thermal Evaporation
- Autorzy:
-
Alaf, M.
Guler, M.
Gultekin, D.
Akbulut, H. - Powiązania:
- https://bibliotekanauki.pl/articles/1399830.pdf
- Data publikacji:
- 2013-02
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
64.70.fm
73.61.At
81.16.Pr - Opis:
- In this study, tin film was thermally evaporated onto a stainless steel substrate in an argon atmosphere. The tin films were then subjected to a DC plasma oxidation process using an oxygen/argon gas mixture. Three different substrate temperatures (100°C, 150°C, and 200°C) and three different oxygen partial pressures (12.5%, 25%, and 50%) were used to investigate the physical and microstructural properties of the films. The surface properties were studied by scanning electron microscopy, X-ray diffraction, atomic force microscopy and a four-point probe electrical resistivity measurement. The grain size and texture coefficient of the tin oxide films were calculated. Both SnO and $SnO_2$ films with grain sizes of 13-43 nm were produced, depending on the oxygen partial pressure. SnO films have flower- and flake-like nanostructures, and $SnO_2$ films have grape-like structures with nanograins. The resistivity values for the $SnO_2$ phase were found to be as low as $10^{-5}$ Ω cm and were observed to decrease with increasing substrate temperature.
- Źródło:
-
Acta Physica Polonica A; 2013, 123, 2; 326-329
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł