- Tytuł:
- Study of Ti, V and Their Oxides-Based Thin Films in the Search for Hydrogen Storage Materials
- Autorzy:
-
Tarnawski, Z.
Zakrzewska, K.
Kim-Ngan, N.-T.
Krupska, M.
Sowa, S.
Drogowska, K.
Havela, L.
Balogh, A. - Powiązania:
- https://bibliotekanauki.pl/articles/1401913.pdf
- Data publikacji:
- 2015-09
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
81.15.Cd
68.49.-h
61.05.C-
68.60.-p - Opis:
- Thin film series consisting of Ti, V, TiO₂ and V₂O₅ layer with different layer geometries, sequences and thicknesses have been prepared by the sputtering technique. The hydrogen depth profile of selected films upon hydrogen charging at 1 bar and/or hydrogenation at pressure up to 102 bar was determined by using secondary ion mass spectrometry and nuclear reaction analysis using a N-15 beam. The highest hydrogen storage with a concentration up to 50 at.% was found in the pure Ti and Ti-contained layer, while it amounts to around 30% in the metallic Ti-V-Ni layer. Hydrogen can diffuse through the TiO₂ layer without accumulation, but can be stored in the VO₂ layer in some cases. Hydrogen can remove the preferential Ti orientation in the films and induce a complete transition of V₂O₅ into VO₂ in the films.
- Źródło:
-
Acta Physica Polonica A; 2015, 128, 3; 431-439
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł