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Wyszukujesz frazę "Bondarenko, A.V." wg kryterium: Autor


Wyświetlanie 1-6 z 6
Tytuł:
Excess Conductivity of Y$\text{}_{0.95}$Pr$\text{}_{0.05}$Ba$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{7-x}$ Single Crystals
Autorzy:
Vovk, R. V.
Obolenskii, M. A.
Bondarenko, A. V.
Goulatis, I. L.
Chroneos, A.
Powiązania:
https://bibliotekanauki.pl/articles/2047236.pdf
Data publikacji:
2007-01
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
71.20.Eh
72.10.-d
74.40.+k
74.72.-h
Opis:
In this work we investigate the conductivity in the basis plane of YBa$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{7-x}$ and Y$\text{}_{1-z}$Pr$\text{}_{z}$Ba$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{7-x}$ single crystals with a system of one-direction twin boundaries. The Pr dopants behave as efficient scattering centers of normal and fluctuating carriers. For this a slight doping with praseodymium (till z≈0.05) results in a significant narrowing of the temperature interval in which the pseudo-gap regime is realized in the ab-plane of YBaCuO single crystals.
Źródło:
Acta Physica Polonica A; 2007, 111, 1; 129-133
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Scattering Processes of Normal and Fluctuating Carriers in ReBa$\text{}_{2}$Cu$\text{}_{3}$O$\text{}_{7-δ}$ (Re = Y, Ho) Single Crystals with Unidirectional Twin Boundaries
Autorzy:
Vovk, R. V.
Obolenskii, M. A.
Bondarenko, A. V.
Goulatis, I. I.
Levy, M. R.
Chroneos, A.
Powiązania:
https://bibliotekanauki.pl/articles/2047234.pdf
Data publikacji:
2007-01
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
71.20.Eh
72.10.-d
74.40.+k
74.72.-h
Opis:
The effect of twin boundaries on the normal and fluctuating conductivity of ReBaCuO (Re = Y, Ho) single crystals was investigated. The results indicate that the Lawrence-Doniach theoretical model describes adequately the temperature dependence of the excess conductivity. The twin boundaries are efficient scattering centers for normal and fluctuating carriers. The derived values of the coherence length perpendicular to the ab-planeξ$\text{}_{c}$(0) are in good agreement with those obtained from magnetic measurements for stoichiometric YBaCuO crystals.
Źródło:
Acta Physica Polonica A; 2007, 111, 1; 123-128
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Modification of MOS Devices by High-Field Electron Injection and Arc Plasma Jet Treatment
Autorzy:
Andreev, V.
Bondarenko, G.
Maslovsky, V.
Stolyarov, A.
Powiązania:
https://bibliotekanauki.pl/articles/1402221.pdf
Data publikacji:
2015-11
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
73.40.Qv
73.40.Gk
Opis:
Methods of modification of gate dielectrics of the MOS structures by high-field electron injection and arc plasma jet treatment were studied. It is possible to use them for correction of parameters, decreasing defects number and increasing reliability of MOS devices. It was found that the negative charge accumulated in the film of the phosphorus-silicate glass of the MOS structures with the two-layer gate dielectric SiO₂-phosphorus-silicate glass under the high-field electron injection can be used for modification of devices with the same structures. It is shown that the injection-thermal treatment allows to find and exclude MOS structures with defects of isolation and charge defects. Arc plasma jet treatment was found to improve characteristics of the MOS devices. These treatments increase injection and radiation resistance of the gate dielectric by creating the needed density of electron traps in the bulk of SiO₂ film.
Źródło:
Acta Physica Polonica A; 2015, 128, 5; 887-890
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Modification of Gate Dielectric in MOS Devices by Injection-Thermal and Plasma Treatments
Autorzy:
Andreev, V.
Bondarenko, G.
Maslovsky, V.
Stolyarov, A.
Powiązania:
https://bibliotekanauki.pl/articles/1381776.pdf
Data publikacji:
2014-06
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
73.40.Qv
73.40.Gk
Opis:
The influence of injection-thermal and plasma treatments on the characteristics of the MOS-structure is studied. It is shown that the thermal stable part of the negative charge which accumulates in the phosphorus-silicate glass (PSG) film in the structures with the two-layer gate dielectric $SiO_2$-PSG under high-field Fowler-Nordheim electron injection can be used for the characteristics modification of MOS-structures with above described structure. The injection-thermal and plasma treatments of MOS-structures are offered to use for improving the reliability and finding the samples which have the charge defects. It is found that using the injection-thermal and plasma treatments allows to increase the injection and radiation stability of the dielectric films of MOS-structures due to structural changes in the $SiO_2$ film and $Si-SiO_2$ interface.
Źródło:
Acta Physica Polonica A; 2014, 125, 6; 1371-1373
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Modification of MIS Devices by Irradiation and High-Field Electron Injection Treatments
Autorzy:
Andreev, D.
Bondarenko, G.
Andreev, V.
Maslovsky, V.
Stolyarov, A.
Powiązania:
https://bibliotekanauki.pl/articles/1030209.pdf
Data publikacji:
2017-08
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
72.20.Ht
72.20.Jv
73.20.At
73.40.Qv
73.40.Ty
77.22.Jp
77.55.-g
Opis:
Methods to modify gate dielectrics of MIS structures by irradiation treatments and high-field electron injection into dielectric are considered. In addition, distinctive features of these methods used to correct parameters of MIS devices are studied. It was found out that negative charge, accumulating in the thin film of phosphosilicate glass (PSG) of the MIS structure having a two-layer gate dielectric SiO_2-PSG under the high-field injection or during the irradiation treatment can be used to correct the threshold voltage to improve the charge stability and raise the voltage of breakdown for the MIS devices. It is proved that the density of electron traps rises with the increasing thickness of the PSG film. In this paper a method to modify electrophysical characteristics of MIS structures by the high-field tunnel injection of electrons into the gate dielectric under the mode of controlled current stress is proposed. The method allows to monitor changing of MIS structure parameters directly during the modification process.
Źródło:
Acta Physica Polonica A; 2017, 132, 2; 245-248
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
KEr(MoO$\text{}_{4}$)$\text{}_{2}$ and CsDy(MoO$\text{}_{4}$)$\text{}_{2}$ - Low-Dimensional Ising Magnets
Autorzy:
Kačmár, M.
Orendáčová, A.
Čizmár, E.
Horváth, D.
Orendáč, M.
Bondarenko, V.
Anders, A. G.
Feher, A.
Jaščur, M.
Powiązania:
https://bibliotekanauki.pl/articles/2013657.pdf
Data publikacji:
2000-05
Wydawca:
Polska Akademia Nauk. Instytut Fizyki PAN
Tematy:
75.40.Cx
75.10.Hk
75.40.Mg
Opis:
In the present work the behaviour of cluster excitations in magnetic field, B, parallel to the easy axis was experimentally studied by the measurements of KEr(MoO$\text{}_{4}$)$\text{}_{2}$ and CsDy(MoO$\text{}_{4}$)$\text{}_{2}$ specific heat, C, vs. B dependence studied at a constant temperature. Corresponding Monte Carlo simulations of C revealed that despite of the fact that the Ising exchange-coupling models proved useful for a sufficient description of the specific heat of these dipolar systems in B=0, the analysis of current experimental data requires a partial renormalization of exchange-coupling constants previously obtained from B=0 analysis. The influence of crystal field effects and long-range character of spin correlations is discussed.
Źródło:
Acta Physica Polonica A; 2000, 97, 5; 807-810
0587-4246
1898-794X
Pojawia się w:
Acta Physica Polonica A
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-6 z 6

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