Autor: Szindler, M. M. - Katalog OPAC zbiorów

Skocz do pozycji: 1.

Tytuł:: The optical parameters of TiO2 antireflection coating prepared by atomic layer deposition method for photovoltaic application
Autorzy:: Szindler, Marek
Szindler, Magdalena M.
Powiązania:: https://bibliotekanauki.pl/articles/1835965.pdf
Data publikacji:: 2020
Wydawca:: Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:: thin film
atomic layer deposition
titanium dioxide
Opis:: Titanium dioxide thin films have been deposited on silicon wafers substrates by an atomic layer deposition (ALD) method. There optical parameters were investigated by spectroscopic ellipsometry and UV/VIS spectroscopy. A material with a refractive index of 2.41 was obtained. Additionally, in a wide spectral range it was possible to reduce the reflection from the silicon surface below 5%. The Raman spectroscopy method was used for structural characterization of anatase TiO2 thin films. Their uniformity and chemical composition are confirmed by a scanning electron microscope (SEM) energy dispersive spectrometer (EDS).
Źródło:: Optica Applicata; 2020, 50, 4; 663-670
0078-5466
1899-7015
Pojawia się w:: Optica Applicata
Dostawca treści:: Biblioteka Nauki

Artykuł

Skocz do pozycji: 2.

Tytuł:: The impact of atomic layer deposition technological parameters on optical properties and morphology of Al2O3 thin films
Autorzy:: Dobrzanski, L. A.
Szindler, M.
Hajduk, B.
Kotowicz, S.
Powiązania:: https://bibliotekanauki.pl/articles/173801.pdf
Data publikacji:: 2015
Wydawca:: Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:: thin film
aluminum oxide
atomic layer deposition
Opis:: This paper presents some results of investigations on aluminum oxide Al2O3 thin films prepared by the atomic layer deposition method on polished monocrystalline silicon. It has been described how the technological parameters of the deposition process, like the number of cycles and substrate temperature, influenced the optical properties and morphology of prepared thin films. Their physical and optical properties like thickness, uniformity and refractive index have been investigated with spectroscopic ellipsometry, atomic force microscopy and UV/vis optical spectroscopy.
Źródło:: Optica Applicata; 2015, 45, 4; 573-583
0078-5466
1899-7015
Pojawia się w:: Optica Applicata
Dostawca treści:: Biblioteka Nauki

Artykuł

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