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Wyszukujesz frazę "Liu, C.G." wg kryterium: Autor


Wyświetlanie 1-2 z 2
Tytuł:
Activating flotation of chalcopyrite using CuSO4 and H2O2 from the cyanide tailings
Autorzy:
Ai, G.
Yan, H.
Qiu, T.
Liu, C.
Powiązania:
https://bibliotekanauki.pl/articles/109562.pdf
Data publikacji:
2018
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
cyanide tailings
chalcopyrite
CuSO4
H2O2
activation mechanism
Opis:
The effects of CuSO4 and H2O2 on the flotation behavior of cyanide chalcopyrite were investigated by flotation tests, microcalorimetry and X-ray photoelectron spectroscopy (XPS). The underlying activation mechanism was studied in the perspective of micro-thermodynamics and surface properties. The flotation results indicated that cyanide chalcopyrite was strongly inhibited by sodium cyanide, with the maximum flotation recovery of 22.5% only. CuSO4 and H2O2 significantly improved the flotation of cyanide chalcopyrite, and the flotation recovery was increased to 92.28% and 84.35%, respectively. The micro-thermodynamics results indicated that the adsorption heat of butyl xanthate on cyanide chalcopyrite surface increased after the addition of CuSO4 and H2O2, as well as the reaction order. CuSO4 and H2O2 can significantly improve the adsorption of butyl xanthate on the surface of cyanide chalcopyrite by decreasing the apparent activation energy by 80.11% and 66.54%, respectively. XPS analysis indicated that the CuCN was generated on the surface of cyanide chalcopyrite, leading to the loss of sulfur and inhibiting the adsorption of collectors. As a result, the flotation of cyanide chalcopyrite was depressed. It is considered that, CuSO4 and H2O2 can improve the flotation of cyanide chalcopyrite by eleminating CuCN from its surface and increasing the concentration of S by 57.02% and 37.48%, respectively.
Źródło:
Physicochemical Problems of Mineral Processing; 2018, 54, 2; 578-589
1643-1049
2084-4735
Pojawia się w:
Physicochemical Problems of Mineral Processing
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Mitigation scratch on fused silica optics using CO2 laser
Autorzy:
Liu, C.-M.
Yan, Z.-H.
Yang, L.
Jiang, Y.
Zu, X.-T.
Wang, H.-J.
Liao, W.
Yuan, X.-D.
Zheng, W.-G.
Powiązania:
https://bibliotekanauki.pl/articles/174978.pdf
Data publikacji:
2016
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
mitigation
scratch
fused silica
CO2 laser
Opis:
The scratch on a fused silica surface was treated as a chain of connected damage sites and mitigated one after another using CO2 laser irradiation. The optical microscopy image shows that a scratch with the width of about 30 μm and length of several millimeters can be completely mitigated without the formation of debris and bubbles. The mitigated scratch can survive under raster scan laser irradiation with the fluency increased up to 11.0J/cm2 at 3ns and 351nm. On the contrary, the substrate without CO2 laser mitigation is seriously damaged under this irradiation. The light modulation induced by mitigation is much smaller when the scratch is mitigated before being damaged. The light modulation is about 2 when the distance to the mitigated sample is larger than 20cm. The birefringence induced by residual stress in the mitigated scratch is measured. The retardance of the mitigated scratch before being damaged is not visible. Therefore, residual stress in this mitigated scratch before being damaged should be not a critical potential risk in laser damage.
Źródło:
Optica Applicata; 2016, 46, 3; 387-397
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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