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Wyszukujesz frazę "thin-films" wg kryterium: Temat


Wyświetlanie 1-4 z 4
Tytuł:
Influence of palladium chemical structure on hydrogen sensing properties of carbonaceous–palladium thin films
Autorzy:
Kaminska, A.
Krawczyk, S.
Kozlowski, C.
Powiązania:
https://bibliotekanauki.pl/articles/173783.pdf
Data publikacji:
2013
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
C–Pd thin films
hydrogen sensor
FTIR spectroscopy
Opis:
In this work we investigate nanocomposite carbonaceous–palladium (C–Pd) films prepared by physical vapor deposition. Such films are promising materials for hydrogen sensor applications. This is related to the highly selective hydrogen absorption by palladium nanocrystallites. The C–Pd films obtained in various technological conditions differ in structure and electrical properties. These films were characterized by SEM, EDS and FTIR spectroscopy. FTIR spec-troscopy was used to determine the amount of palladium acetate and fullerene, incompletely decomposed during the deposition process. FTIR spectra enabled us to explain the differences in C–Pd films resistance based on palladium chemical structure. The possibility of the application of C–Pd films as active layers in hydrogen sensors was also studied. The results showed that synthesized C–Pd films containing palladium nanograins could be used for hydrogen sensing.
Źródło:
Optica Applicata; 2013, 43, 4; 633-640
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Photocatalytic properties of Ti–V oxides thin films
Autorzy:
Domaradzki, J
Mazur, M
Sieradzka, K
Wojcieszak, D
Adamiak, B
Powiązania:
https://bibliotekanauki.pl/articles/174210.pdf
Data publikacji:
2013
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
titanium dioxide (TiO2)
thin films
magnetron sputtering
vanadium
photocatalysis
Opis:
In this work, the photocatalytic properties of Ti–V oxides thin films with 19 and 23 at.% of vanadium addition have been outlined. The films were deposited by the high energy reactive magnetron sputtering method. X-ray photoelectron spectroscopy measurements were done in order to determine the chemical composition and binding energy of the elements on the samples surface. Additionally, based on wettability measurements, the water contact angles were evaluated and were equal to ca. 94° and 55° for thin films with 19 and 23 at.% of V, respectively. This testifies about hydrophilic and hydrophobic properties, respectively. Photoactivity of thin films was determined by percent decomposition of phenol for 5 hours during UV–vis radiation exposure. The highest photocatalytic activity of 6.2%/cm2 was obtained for thin films with 19 at.% of V. It has been found that an increase in V amount in Ti–V oxides thin films to 23 at.% results in lowered to 3%/cm2 photocatalytic activity.
Źródło:
Optica Applicata; 2013, 43, 1; 153-162
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
The GdF3/MgF2 bilayer as an antireflective narrow-band ultraviolet filter
Autorzy:
Marszałek, K.
Małek, A.
Winkowski, P.
Powiązania:
https://bibliotekanauki.pl/articles/173197.pdf
Data publikacji:
2016
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
thin antireflective films
GdF3
MgF2
UV filters
Opis:
The effective work of optical systems, applied in advanced optic and optoelectronic devices, requires antireflective coatings. In this work we focus on designing the bilayer system dedicated to work as a narrow-band filter within UV range of electromagnetic spectrum. Such coatings are applied in lasers where reduction in reflection to a small value at any single wavelength is needed. The bilayer system is based on GdF3 and MgF2 used as materials with middle and low refractive index. The multilayers were obtained by thermal evaporation on a highly purified CaF2 substrates. The spectral dispersion of the refractive index of single layers has been determined by ellipsometric measurements. Thicknesses of single layers included in the bilayer system, aimed to work at specific wavelength, have been optimized based on optical characteristics simulation, including experimentally measured values of the refractive indices. During the deposition, layer thickness and deposition rate were controlled with Inficon XTC/2 thickness measuring system. Optical properties of obtained GdF3/MgF2 bilayer systems have been determined based on spectral dependences of reflectance and transmittance measured with the application of a spectrophotometer. The crystal structure and phase composition of the films have been examined by X-ray diffraction. The result of studies revealed that proper optimization of thicknesses of individual layers creating GdF3/MgF2 bilayer systems makes it possible to obtain the antireflective coating for desired wavelength of electromagnetic spectrum. The GdF3/MgF2 antireflective bilayer will be applied as a narrow-band filter for 238 nm irradiation produced by gas-ion/BBO crystal laser.
Źródło:
Optica Applicata; 2016, 46, 2; 187-197
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Optical methods applied in thickness and topography testing of passive layers on implantable titanium alloys
Autorzy:
Szewczenko, J
Jaglarz, J
Basiaga, M
Kurzyk, J
Paszenda, Z
Powiązania:
https://bibliotekanauki.pl/articles/173875.pdf
Data publikacji:
2013
Wydawca:
Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
Tematy:
biomaterials
Ti-6Al-7Nb
passive layer
light scattering
bidirectional reflection distribution function (BRDF)
thin films optics
Opis:
The work presents the results of the applied surface pretreatment on topography and thickness of a passive layer of the anodically oxidized Ti6Al7Nb alloy. In our study were used: integrating sphere spectral measurements, bidirectional reflection distribution function (BRDF) method and optical profilometry. On the basis of the study, the passive layer thickness, roughness, waviness and the autocorrelation length were determined. The influence of voltage of anodization on topographical parameters of TiO2 has been discussed.
Źródło:
Optica Applicata; 2013, 43, 1; 173-180
0078-5466
1899-7015
Pojawia się w:
Optica Applicata
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-4 z 4

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