- Tytuł:
- The optical parameters of TiO2 antireflection coating prepared by atomic layer deposition method for photovoltaic application
- Autorzy:
-
Szindler, Marek
Szindler, Magdalena M. - Powiązania:
- https://bibliotekanauki.pl/articles/1835965.pdf
- Data publikacji:
- 2020
- Wydawca:
- Politechnika Wrocławska. Oficyna Wydawnicza Politechniki Wrocławskiej
- Tematy:
-
thin film
atomic layer deposition
titanium dioxide - Opis:
- Titanium dioxide thin films have been deposited on silicon wafers substrates by an atomic layer deposition (ALD) method. There optical parameters were investigated by spectroscopic ellipsometry and UV/VIS spectroscopy. A material with a refractive index of 2.41 was obtained. Additionally, in a wide spectral range it was possible to reduce the reflection from the silicon surface below 5%. The Raman spectroscopy method was used for structural characterization of anatase TiO2 thin films. Their uniformity and chemical composition are confirmed by a scanning electron microscope (SEM) energy dispersive spectrometer (EDS).
- Źródło:
-
Optica Applicata; 2020, 50, 4; 663-670
0078-5466
1899-7015 - Pojawia się w:
- Optica Applicata
- Dostawca treści:
- Biblioteka Nauki
Artykuł