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Wyświetlanie 1-3 z 3
Tytuł:
The role of magnetic energy on plasma localization during the glow discharge under reduced pressure
Autorzy:
Chodun, R.
Nowakowska-Langier, K.
Zdunek, K.
Okrasa, S.
Powiązania:
https://bibliotekanauki.pl/articles/147975.pdf
Data publikacji:
2016
Wydawca:
Instytut Chemii i Techniki Jądrowej
Tematy:
glow discharge
grounded magnetron
magnetron sputtering
Opis:
In this work, we present the first results of our research on the synergy of fields, electric and magnetic, in the initiation and development of glow discharge under reduced pressure. In the two-electrode system under reduced pressure, the breakdown voltage characterizes a minimum energy input of the electric field to initiate and sustain the glow discharge. The glow discharge enhanced by the magnetic field applied just above the surface of the cathode influences the breakdown voltage decreasing its value. The idea of the experiment was to verify whether the contribution of potential energy of the magnetic field applied around the cathode is sufficiently effective to locate the plasma of glow discharge to the grounded cathode, which, in fact, is the part of a vacuum chamber wall (the anode is positively biased in this case). In our studies, we used the grounded magnetron unit with positively biased anode in order to achieve favorable conditions for the deposition of thin films on fibrous substrates such as fabrics for metallization, assuming that locally applied magnetic field can effectively locate plasma. The results of our studies (Paschen curve with the participation of the magnetic field) seem to confirm the validity of the research assumption. What is the most spectacular – the glow discharge was initiated between introduced into the chamber anode and the grounded cathode of magnetron ‘assisted’ by the magnetic field (discharge did not include the area of the anode, which is a part of the magnetron construction).
Źródło:
Nukleonika; 2016, 61, 2; 191-194
0029-5922
1508-5791
Pojawia się w:
Nukleonika
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
The TSL 6.4 GHz ECR ion source – status, improvements and measurements
Autorzy:
van Rooyen, D.
Wessman, D.
Powiązania:
https://bibliotekanauki.pl/articles/148680.pdf
Data publikacji:
2003
Wydawca:
Instytut Chemii i Techniki Jądrowej
Tematy:
ion source
after-glow mode
ECR
Opis:
The TSL 6.4 GHz ECR ion source performs reliably and is well optimized for the various ion species that are routinely provided for experiments. Beam intensities are comparable with other similar sources but at the lower end of the spectrum. We are thus investigating a number of methods of improvement. The development of a micro-oven for low melting point materials was successfully concluded. Further development is needed to improve the consumption rate in order to enable more effective use of expensive isotopes. Measurements with operation of the source in the after-glow mode were successful but the pulse to pulse reproducibility should be further improved. Although the maximum gain compared to the CW mode is satisfactory, accomplishing a higher factor would be even more advantageous for beams delivered to CELSIUS. A systematic study of various parameters was started in order to find optimal operating conditions running in the after-glow mode
Źródło:
Nukleonika; 2003, 48,suppl.2; 99-104
0029-5922
1508-5791
Pojawia się w:
Nukleonika
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Non-self-sustained discharge with hollow anode for plasma-based surface treatment
Autorzy:
Misiruk, I. O.
Timoshenko, O. I.
Taran, V. S.
Garkusha, I. E.
Powiązania:
https://bibliotekanauki.pl/articles/147876.pdf
Data publikacji:
2016
Wydawca:
Instytut Chemii i Techniki Jądrowej
Tematy:
diffusion saturation
film deposition
hollow anode
ion etching
ion pumping
non-self-sustained glow discharge
Opis:
The paper discusses plasma methods for surface modification using the non-self-sustained glow discharge with a hollow anode. This discharge is characterised by low voltage and high values of electron and ion currents. It can be easily excited in vacuum-arc installations that are widely used for coatings deposition. It is shown that such type of discharge may be effectively used for ion pumping, film deposition, ion etching, diffusion saturation of metallic materials, fusion and brazing of metals, and for combined application of above mentioned technologies in a single vacuum cycle.
Źródło:
Nukleonika; 2016, 61, 2; 195-199
0029-5922
1508-5791
Pojawia się w:
Nukleonika
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-3 z 3

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