Informacja

Drogi użytkowniku, aplikacja do prawidłowego działania wymaga obsługi JavaScript. Proszę włącz obsługę JavaScript w Twojej przeglądarce.

Wyszukujesz frazę "atomic property" wg kryterium: Temat


Wyświetlanie 1-3 z 3
Tytuł:
Electrical Characteristics of Tin Oxide Films Grown by Thermal Atomic Layer Deposition
Autorzy:
Yoon, Seong Yu
Choi, Byung Joon
Powiązania:
https://bibliotekanauki.pl/articles/352926.pdf
Data publikacji:
2020
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
atomic layer deposition
tin oxide
electrical property
oxygen adsorption
Opis:
Tin dioxide (SnO2 ) is an n-type semiconductor and has useful characteristics of high transmittance, excellent electrical properties, and chemical stability. Accordingly, it is widely used in a variety of fields, such as a gas sensor, photocatalyst, optoelectronics, and solar cell. In this study, SnO2 films are deposited by thermal atomic layer deposition (ALD) at 180°C using Tetrakis(dimethylamino)tin and water. A couple of 5.9, 7.4 and 10.1nm-thick SnO2 films are grown on SiO2 /Si substrate and then each film is annealed at 400°C in oxygen atmosphere. Current transport of SnO2 films are analyzed by measuring current – voltage characteristics from room temperature to 150°C. It is concluded that electrical property of SnO2 film is concurrently affected by its semiconducting nature and oxidative adsorption on the surface.
Źródło:
Archives of Metallurgy and Materials; 2020, 65, 3; 1041-1044
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Structural Aging and Degradation of Human Fingernail Plates Upon Cosmetic Agents
Autorzy:
Kulesza, S.
Bramowicz, M.
Gwoździk, M.
Wilczyński, S.
Goździejewska, A. M.
Powiązania:
https://bibliotekanauki.pl/articles/354662.pdf
Data publikacji:
2019
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
Atomic Force Microscopy
Scanning Electron Microscopy
fractal characterization
nanoscale property mapping
Opis:
The knowledge whether and how chemical species react with tissues is important because of protection against harmful factors, diagnose of dermatological diseases, validation of dermatological procedures as well as effectiveness of topical therapies. In presented work the effects of chemical agents on plates of human fingernails were studied using Atomic Force Microscopy and Scanning Electron Microscopy. Apart from that, mapping of the elastic properties of the nails was also carried out. To obtain reliable measures of spatial evolution of the surface variations, recorded images were analyzed in terms of scaling invariance brought by fractal geometry, instead of common though not unique statistical measures.
Źródło:
Archives of Metallurgy and Materials; 2019, 64, 1; 181-184
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Growth Temperature Effect of Atomic-Layer-Deposited GdOx Films
Autorzy:
Ryu, Sung Yeon
Yun, Hee Ju
Lee, Min Hwan
Choi, Byung Joon
Powiązania:
https://bibliotekanauki.pl/articles/2049285.pdf
Data publikacji:
2021
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
gadolinium oxide
Gd2O3
rare-earth oxide
atomic layer deposition
hydrophobicity
electrical property
Opis:
Gadolinium oxide (Gd2O3) is one of the lanthanide rare-earth oxides, which has been extensively studied due to its versatile functionalities, such as a high permittivity, reactivity with moisture, and ionic conductivity, etc. In this work, GdOx thin film was grown by atomic layer deposition using cyclopentadienyl (Cp)-based Gd precursor and water. As-grown GdOx film was amorphous and had a sub-stoichiometric (x ~ 1.2) composition with a uniform elemental depth profile. ~3 nm-thick GdOx thin film could modify the hydrophilic Si substrate into hydrophobic surface with water wetting angle of 70°. Wetting and electrical test revealed that the growth temperature affects the hydrophobicity and electrical strength of the as-grown GdOx film.
Źródło:
Archives of Metallurgy and Materials; 2021, 66, 3; 755-758
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-3 z 3

    Ta witryna wykorzystuje pliki cookies do przechowywania informacji na Twoim komputerze. Pliki cookies stosujemy w celu świadczenia usług na najwyższym poziomie, w tym w sposób dostosowany do indywidualnych potrzeb. Korzystanie z witryny bez zmiany ustawień dotyczących cookies oznacza, że będą one zamieszczane w Twoim komputerze. W każdym momencie możesz dokonać zmiany ustawień dotyczących cookies