- Tytuł:
- Characterization of TiAlV Films Prepared by Vacuum Arc Deposition: Effect of Substrate Temperature
- Autorzy:
-
Abdallah, B.
Mrad, O.
Ismail, I. - Powiązania:
- https://bibliotekanauki.pl/articles/1400306.pdf
- Data publikacji:
- 2013-01
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
68.55.-a
87.85.jf - Opis:
- Three TiAlV films have been prepared by vacuum arc discharge technique at different substrate temperatures (50, 300, and 400°C). The depositions were carried out from aluminum, vanadium and titanium elemental targets. The temperature effects on the crystalline quality and texture have been investigated by means of X-ray diffraction. Two phases have been identified and the grain size has been found to increase with temperature. The composition of the films has been determined by proton induced X-ray emission technique. The Ti ratio was found to increase with temperature. The microhardness, measured by the Vickers indentation method was found to decrease with temperature. X-ray photoelectron spectroscopy was used to study the chemical composition of the passive layer formed on the films by analyzing high resolution spectra of Al 2p, Ti 2p and V 2p. This layer was mainly composed of $TiO_2$ with a small participation of other oxidation and metallic states of Ti, Al and V.
- Źródło:
-
Acta Physica Polonica A; 2013, 123, 1; 76-79
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł