- Tytuł:
- Ultrathin Niobium in the Si/Nb/Si Trilayers
- Autorzy:
-
Zaytseva, I.
Abal'oshev, O.
Dłużewski, P.
Minikayev, R.
Cieplak, Marta
Zhu, L.
Chien, C. - Powiązania:
- https://bibliotekanauki.pl/articles/1374193.pdf
- Data publikacji:
- 2014-10
- Wydawca:
- Polska Akademia Nauk. Instytut Fizyki PAN
- Tematy:
-
74.78.-w
74.70.Ad
74.25.-q - Opis:
- We study magnetotransport properties of the Si/Nb/Si trilayers, in which the thickness of niobium, d, changes from 1.1 nm to 50 nm, while the thickness of Si is fixed at 10 nm. The niobium films are amorphous for d < 4 nm, while in thicker films the alligned polycrystalline grains are formed. We observe that the Hall coefficient changes sign into negative in the films with d < 1.6 nm. We also find that in the ultrathin films the magnetic field induces a transition from the superconducting into a metallic phase with the resistance smaller than the normal-state resistance.
- Źródło:
-
Acta Physica Polonica A; 2014, 126, 4a; A-140-A-144
0587-4246
1898-794X - Pojawia się w:
- Acta Physica Polonica A
- Dostawca treści:
- Biblioteka Nauki
Artykuł