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Wyszukujesz frazę "Chodun, R." wg kryterium: Autor


Wyświetlanie 1-2 z 2
Tytuł:
The role of magnetic energy on plasma localization during the glow discharge under reduced pressure
Autorzy:
Chodun, R.
Nowakowska-Langier, K.
Zdunek, K.
Okrasa, S.
Powiązania:
https://bibliotekanauki.pl/articles/147975.pdf
Data publikacji:
2016
Wydawca:
Instytut Chemii i Techniki Jądrowej
Tematy:
glow discharge
grounded magnetron
magnetron sputtering
Opis:
In this work, we present the first results of our research on the synergy of fields, electric and magnetic, in the initiation and development of glow discharge under reduced pressure. In the two-electrode system under reduced pressure, the breakdown voltage characterizes a minimum energy input of the electric field to initiate and sustain the glow discharge. The glow discharge enhanced by the magnetic field applied just above the surface of the cathode influences the breakdown voltage decreasing its value. The idea of the experiment was to verify whether the contribution of potential energy of the magnetic field applied around the cathode is sufficiently effective to locate the plasma of glow discharge to the grounded cathode, which, in fact, is the part of a vacuum chamber wall (the anode is positively biased in this case). In our studies, we used the grounded magnetron unit with positively biased anode in order to achieve favorable conditions for the deposition of thin films on fibrous substrates such as fabrics for metallization, assuming that locally applied magnetic field can effectively locate plasma. The results of our studies (Paschen curve with the participation of the magnetic field) seem to confirm the validity of the research assumption. What is the most spectacular – the glow discharge was initiated between introduced into the chamber anode and the grounded cathode of magnetron ‘assisted’ by the magnetic field (discharge did not include the area of the anode, which is a part of the magnetron construction).
Źródło:
Nukleonika; 2016, 61, 2; 191-194
0029-5922
1508-5791
Pojawia się w:
Nukleonika
Dostawca treści:
Biblioteka Nauki
Artykuł
Tytuł:
Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering
Autorzy:
Wicher, B.
Chodun, R.
Nowakowska-Langier, K.
Okrasa, S.
Król, K.
Minikayev, R.
Strzelecki, G.
Zdunek, K.
Powiązania:
https://bibliotekanauki.pl/articles/350987.pdf
Data publikacji:
2018
Wydawca:
Polska Akademia Nauk. Czytelnia Czasopism PAN
Tematy:
magnetron sputtering
modulated pulse magnetron sputtering
plasma&films characterization
Opis:
This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.
Źródło:
Archives of Metallurgy and Materials; 2018, 63, 3; 1339-1344
1733-3490
Pojawia się w:
Archives of Metallurgy and Materials
Dostawca treści:
Biblioteka Nauki
Artykuł
    Wyświetlanie 1-2 z 2

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