Deposition and Analysis of DLC Thin Films Obtained on 7075 Aluminum Alloy

In this study a-C:H (hydrogenated amorphous carbon) thin films were deposited on the 7075 Al alloy without and with admixture gas (N2) using a DC CVD (direct current chemical vapor deposition) method. The structural and mechanical properties were analyzed using Raman spectroscopy, SEM and nanoindentation. We obtained hardness of a-C:H thin film without and with N2 equal to 27.3 GPa and 21.4 GPa, respectively. Values of the Young’s modulus were equal to 135.5 GPa and 205.2 GPa, respectively.