ZnO films: propeties determined by electronic microscopy and ellipsometry

Zinc oxide is a good material for application in nanoand optoelectronics due to its notable features, for example, large band gap. In this work ZnO films deposited by reactive magnetron sputtering at various pressure of residual gases and different temperatures of the substrate are investigated. The spectral dependences of ellipsometric parameters and of the films are determined by ellipsometry. The effective values of optical constants and are calculated. The roughness and the texture of the surfaces are obtained by Atomic-Force Microscopy (AFM) and Scanning Electronic Microscopy (SEM). One indicates that the refractive index decreases when reducing the pressure of residual gases, and the roughness decreases when elevating the temperature of the substrate. Thus, the behavior of some properties of the films at various conditions of deposition is determined.