Application of advanced oxidation process (H2O2/UV) for removal of organic materials from pharmaceutical industry effluent

Pharmaceutical wastewater is one of the major complex and toxic industrial effluents containing little or no biodegradable organic matters. In this study, H₂O₂/UV based advanced oxidation process (AOP) was used to remove organic materials from pharmaceutical industry effluent. For the chemical oxygen demand (COD) removal radiation of medium pressure mercury vapor UV lamp was used in the presence of hydrogen peroxide (H₂O₂/UV). Results indicated that the efficiency of COD removal depends on the initial concentration H₂O₂, oxidation time and pH. The efficiency of COD removal at low H₂O₂con-centration was very low even coupled with UV light, which can be attributed to the low generation of hydroxyl radicals (OH). At high concentration of H₂O₂ (500 mg/dm³) and optimum pH (pH = 4), 87.6% removal efficiency could be achieved during 70 min oxidation. For high concentration of H₂O₂ (500 mg/dm³) at pH 3 and 7, the maximum COD removal efficiency was 28.5% and 15.2% respectively, indicating significant roles of pH and H₂O₂concentration in the process of COD removal.