Positron Implantation Profile in Kapton

The discussion presented in the paper focuses on processes accompanying positron implantation in condensed matter. They finally constitute the positron implantation profile which generally does not exhibit the exponential behavior as it is concluded from the Monte Carlo simulation made using the EGSnrc 4.0 code. The simulation was performed for the kapton and two commonly used positron sources $\text{}^{22}$Na and $\text{}^{68}$Ge/g$\text{}^{68}$Ga. New formula for the implantation profile was proposed.