An apparatus for sequential pulsed plasma beam treatment in combination with Arc PVD deposition

A hybrid type of apparatus is described which enables one to form a thin multi-layer film on the surface of any kind of solid substrate. In one process, the surface is treated with a high intensity pulse plasma beam which introduces the chosen kind of atoms into the near-surface layer of the substrate. In the second process, following the first without breaking the vacuum, the coating is formed by arc PVD (physical vapour deposition) process. Two examples of coatings formed on metallic and ceramic substrates are presented.