Preparation, Study and Nanoscale Growth of Indium Oxide Thin Films

Indium oxide $(In_2O_3)$ thin films were deposited on glass substrate by varying substrate temperature in the range of 400-600C using the spray pyrolysis technique. In this research, physical properties of indium oxide thin films were studied and then nanocrystalline sizes at different substrate temperature were deeply compared and investigated. All films were characterized at room temperature using X-ray diffraction, scanning electron microscopy, atomic force microscopy, photoluminescence, the Hall effect and UV-visible spectrophotometer. The optimal substrate temperature to obtain films of high crystallographic quality was 575°C, for this temperature, the electrical resistivity was in the order of ρ=0.147 Ω cm. For comparing optical transmittance and electrical conductivity the best figure of merit of the films was achieved at 575C.