X-ray Diffraction Topography - Investigation of Single Crystals Grown by the Czochralski Method

X-ray diffraction topography is one of basic diagnostics tools serving for visualisation of single crystal lattice defects. Defects of various kinds can be observed. The present study is a review of topographic results obtained in the X-ray laboratory of the Institute of Experimental Physics, University of Warsaw, for three families of single crystals grown by the Czochralski method: (i) silicon (Si) and $Si_{1-x}Ge_{x}$, (ii) selected binary REVO_4 oxides and (iii) selected ternary $ABCO_4$ oxides. The effect of chemical composition, growth conditions and post growth thermal annealing on the defect appearing in crystals is discussed. Various defects are revealed: the growth dislocations (some early Si crystals), the composition-gradient-induced lattice deformation $(Si_{1-x}Ge_{x}$, solid solutions $Ca_{x}Sr_{1-x}NdAlO_4)$, defects generated in Si after the post growth thermal processes, oriented elongated rod-like macro-defects tending to form networks within the crystal core, cellular structure in the outer shell $(SrLaGaO_4)$, and variously developed block structure (in selected binary $\text{REVO}_4$ crystals).