Microstructure Development in Multilayer $TiB_x // TiSi_y C_z$ Coatings during Post-Deposition Heat Treatment

Multilayer amorphous $TiB_{x} // TiSi_{y}C_{z}$ coatings were formed by duplex treatment: dual beam ion beam assisted deposition and pulsed laser deposition. Post-deposition heating was applied to activate crystallization in the coating. In situ transmission electron microscopy heating experiments were conducted in the temperature range 20-600°C. Crystallization of TiB₂ phase in $TiB_{x}$ layers begun at 450°C, while $TiSi_{y}C_{z}$ layers retained nearly amorphous up to 600°C.